Indium Trioxide Preparation and Characterization using Pulsed Laser Deposition at Various Energies of Laser

Abstract

The impact of varying the pulsed laser intensity on the characteristics of the produced indium tri-oxide thin (In2O3) films was examined in this work. using silicon bases and the pulsed laser deposition (PLD) technique. utilizing a (Nd:YAG) laser with a wavelength of 1064 nm, In2O3 nanofilms were produced utilizing the pulsed laser deposition technique. X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy, and UV-visible spectroscopy were used to analyses the material. The morphological characteristics show the microscope image and polycrystalline nature. The (AFM) atomic force microscopy analysis revealed that a nono-films made using the technique of the deposition by pulsed laser, have a good and homogeneous crystal surface, while electron scanning demonstrated that the spherical of nanostructure formation with the changes in the optical results occurs as the energies of laser increases, and UV-visible spectroscopy were used to analyses the deposited Nano films.