Lee, Sai Link, Chan Lik Tan, and Mohamed Fauzi Packeer Mohamed. “A Review: The Response of Fluorine Implantation on Silicon PMOS at Poly-Si Gate, P+ N-Junction, and Ti-Salicide ”. International Journal of Nanoelectronics and Materials (IJNeaM) 18, no. 3 (August 4, 2025): 433–442. Accessed September 30, 2025. https://ejournal.unimap.edu.my/index.php/ijneam/article/view/1204.