Lee Boon Thuan, M.K. Md Arshad, and W.M.W Norhaimi. 2026. “Improvement of Gate Oxide Thickness Uniformity in Advanced U-MOSFETs through Multi-Layer Furnace Oxidation”. International Journal of Nanoelectronics and Materials (IJNeaM) 19 (2):311-21. https://ejournal.unimap.edu.my/index.php/ijneam/article/view/3151.