SH. M. ELADL; K. A. SHARSHAR. Experimental Performance Analysis of Fabricated Si/Ge Thin Film Structure. International Journal of Nanoelectronics and Materials (IJNeaM) , [S. l.], v. 16, n. 1, p. 53–61, 2024. DOI: 10.58915/ijneam.v16i1.925. Disponível em: https://ejournal.unimap.edu.my/index.php/ijneam/article/view/925. Acesso em: 22 nov. 2024.