LEE BOON THUAN; M.K. MD ARSHAD; W.M.W NORHAIMI. Evaluate the impact of advanced cell pitch on U-MOSFET wafer edge IGSS failure in a CMOS environment. International Journal of Nanoelectronics and Materials (IJNeaM) , [S. l.], v. 19, n. 2, p. 289–297, 2026. DOI: 10.58915/ijneam.v19i2.3107. Disponível em: https://ejournal.unimap.edu.my/index.php/ijneam/article/view/3107. Acesso em: 13 jun. 2026.