EVAN T. SALIM; AHMED T. HASSAN; RANA O MAHDI; FORAT H. ALSULTANY. Physical Properties of HfO2 Nano Structures Deposited using PLD. International Journal of Nanoelectronics and Materials (IJNeaM) , [S. l.], v. 16, n. 3, p. 495–510, 2024. DOI: 10.58915/ijneam.v16i3.1266. Disponível em: https://ejournal.unimap.edu.my/index.php/ijneam/article/view/1266. Acesso em: 23 nov. 2024.