MOHAMMED ABDUL MUQEET; TUMMALA RANGA BABU. Temperature Characterization and Performance Enhancement of a 7nm FinFET Structure Using HK Materials and GaAs as Metal Gate (MG). International Journal of Nanoelectronics and Materials (IJNeaM) , [S. l.], v. 17, n. 3, p. 355–361, 2024. DOI: 10.58915/ijneam.v17i3.1116. Disponível em: https://ejournal.unimap.edu.my/index.php/ijneam/article/view/1116. Acesso em: 19 sep. 2024.